Installation for the surface treatment of substrates by evaporation

摘要

An installation is claimed for evaporation of materials onto substrates. The installation is of the type that incorporates a frame (3') suspended to rotate around a first vertical shaft (4) carrying at least three jibs (P1 - P5) for receiving at least three concave supports (S1 - S5) for the small plates to be treated mounted to rotate around some second shafts (A1 - A5) carried by the jibs (P1 - P5). The jibs (P1 - P5) inscribe themselves in a cone coaxial with the first shaft (4) in such a manner that the second shafts (A1 - A5) describe a circular movement in a plane perpendicular to the vertical shaft (4). The supports (S1 - S5) are arranged so that they are overlapping each other. The axis of each support (S1 - S5) is inclined at an angle determined with respect to the radii of the circle passing through the summits of the supports. The second shafts (A1 - A5) are regularly distributed, the periphery of each support (S1 - S5) being close to the summits of the neighbour ing supports. The vertical shaft (4) is suspended from an upper wall (5) of an enclosure (1) containing a source of evaporation (6). The method of augmenting the treatment capacity of the evaporation installation is also claimed.