| 摘要 |
PROBLEM TO BE SOLVED: To obtain a cleaning agent composition containing a specific fluorine- based surfactant, a phosphonic acid compound and ammonia, having excellent particle-removing performance, free from the problems of the surface damage to a silicon substrate and the deposition of metallic impurities on the substrate and causing no foaming problem. SOLUTION: This cleaning agent contains (A) a fluorine-based surfactant consisting of a compound of the formula [R1 is a fluoroalkyl; R2 is H or a lower alkyl; X is CH2 COO or (CH2 CH2 O)n ((n) is 2-10)], (B) a compound having two or more phosphonic acid groups (e.g. N,N,N',N'-ethylenediaminetetra (methylenephosphonic acid) or nitrilotris (methylenephosphonic acid)), (C) ammonia and optionally further (D) hydrogen peroxide. The amounts of the components A and B are preferably 0.001-0.3wt.% and 0.00005-0.03wt.%, respectively. |
