发明名称 VAPOR-DEPOSITED FILM
摘要 PROBLEM TO BE SOLVED: To prepare a film having metallic gloss excellent in decorativeness without being detected by certain kinds of metal detectors by forming a vapor depositing layer with a specified thickness essentially consisting of Al and oxygen on a substrate film and specifying the surface electric resistance and light reflectance on the side of the vapor depositing layer. SOLUTION: At least one side of a substrate film is provided with a vapor depositing layer (VAO) with 300 to 3000Åthickness essentially consisting of Al and oxygen. The electric resistance of the surface of the vapor depositing layer is regulated to 3.0Ω/square, and the light reflectance at 400mμwavelength on the side of the vapor depositing layer is regulated to >=80%. The film stock is composed of one or more kinds among polyester contg. >=85wt.% unit of polyethylene terephthalate, polyolefine and polyamide. The ratio of the total of Al to oxygen occupied in the vapor depositing layer is preferably regulated to >=90%. Al and oxygen are properly coexistent and are integrated and arranged as one layer to form the vapor depositing layer. The vapor depositing layer may contain the nitride of Al, the oxide of silicon and the nitride of silicon.
申请公布号 JPH10140331(A) 申请公布日期 1998.05.26
申请号 JP19960316946 申请日期 1996.11.12
申请人 OIKE IND CO LTD 发明人 GOTO DENICHIRO
分类号 C23C14/08;(IPC1-7):C23C14/08 主分类号 C23C14/08
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