| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an abrasive liquid supplying device capable of stably supplying abrasive liquid having the constant concentration by preventing precipitation to a piping through which abrasive liquid is to be allowed to flow and to a wall surface of a container for temporarily storing abrasive liquid. SOLUTION: An abrasive liquid supplying device for supplying abrasive liquid to polishing devices 22 is provided with at least two supplying sources for undiluted solution and diluent, a mixing part 18 for mixing undiluted solution and diluent to be supplied from the supplying sources, and extracting paths 24 for supplying abrasive liquid mixed in the mixing part 18 to the polishing devices 22, and the mixing part 18 is so constituted as to be airtight in relation to the external space. As undiluted solution of abrasive liquid, acid, alkaline and neutral liquid containing grains having the specified grain size, such as silica gel, are used according to the polishing target, and pure water having no impurity is used as diluent.</p> |
