| 摘要 |
<p>PROBLEM TO BE SOLVED: To efficiently and securely wash and dry the substrate holding chuck. SOLUTION: The washing and drying device for the substrate holding chuck equipped with one or plural lower hold rods 31 holding the lower part of a wafer, and plural side holding rods 32 and 33 which hold the side parts of the wafer on both sides of the lower holding rod 31 and can be displaced onto the same plane with the lower holding rod 31, is equipped with a container 40 which is formed in a box shape and has opening parts 41 where the respective holding part rods 31 to 33 can be inserted on its top surface and one flank, a pure water jet nozzle 42 which is arranged in the container 40 and jets washing liquid toward the hold rods 31 to 33, and air jet nozzles 43 to 45 which are arranged in the container 40 and jet dry gas, e.g. air K toward the holding rods 31 to 33. Then the wafer carrying chuck and container 40 are so formed that they can move relatively horizontally along the length of the holding rods 31 to 33 and vertically.</p> |
