发明名称 |
SEMI-AQUEOUS POLYMER REMOVAL COMPOSITIONS WITH ENHANCED COMPATIBILITY TO COPPER, TUNGSTEN, AND POROUS LOW- DIELECTRICS |
摘要 |
<p>A composition is provided that is effective for removing post etch treatment (PET) polymeric films and photoresist from semiconductor substrates. The composition exhibits excellent polymer film removal capability while maintaining compatibility with copper and low-κdielectrics and contains water, ethylene glycol, a glycol ether solvent, morpholinopropylamine and a corrosion inhibiting compound and optionally one or more metal ion chelating agent, one or more other polar organic solvent, one or more tertiary amine, one or more aluminum corrosion inhibition agent, and one or more surfactant.</p> |
申请公布号 |
EP2715783(A1) |
申请公布日期 |
2014.04.09 |
申请号 |
EP20120793380 |
申请日期 |
2012.05.31 |
申请人 |
AVANTOR PERFORMANCE MATERIALS, INC. |
发明人 |
GEMMILL, WILLIAM, R.;WESTWOOD, GLENN |
分类号 |
H01L21/311;C11D3/00;C11D3/20;C11D3/28;C11D3/30;C11D11/00;G03F7/42;H01L21/02 |
主分类号 |
H01L21/311 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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