EXPOSURE METHOD AND POSITION ALIGNMENT MARK

摘要

PROBLEM TO BE SOLVED: To provide an exposure method capable of restraining decrease of superposition precision which is caused by pattern distortion due to difference of scanning direction of a light slit of a scanning transfer type aligner, in an exposure method using the scanning transfer type aligner and an EB aligner. SOLUTION: A distortion coefficient of each scanning direction in scanning transfer type aligner is calculated (step S1). An overall distortion coefficient is calculated by superposing the above distortion coefficient and a distortion coefficient of the EB aligner. Correction obtained from the overall distortion coefficient is considered, and exposure is performed by superposing an EB exposure pattern on an optical exposure pattern.