发明名称 ALIGNING METHOD, FABRICATION OF DEVICE USING THAT METHOD, AND ALIGNER
摘要 PROBLEM TO BE SOLVED: To resolve a fine pattern having periodicity in a plurality of directions or frequency components in a plurality of spaces by resolving the part of a pattern to be formed having difference in the fineness or the part having difference in the circumferential direction by at least two times and performing exposure at least two times. SOLUTION: The entire pattern to be exposed is resolved depending on the arranging direction of pattern or the fineness of pattern and alignment is carried out using one or a plurality of reticles having resolved patterns. A diffraction lattice pattern 4 is mounted on a moving table 24 and can be replaced by a diffraction lattice pattern 4a having different pitch so that the concentrating position on the plane corresponding Fourier transform of a reticle pattern 13 or the vicinity thereof (pupil face) is varied according to each resolution pattern. The diffraction lattice patterns 4, 4a can be shifted or turned in an arbitrary direction within a plane perpendicular to the optical axis AX by means of a motor or gear included in the moving table 24.
申请公布号 JP2000311853(A) 申请公布日期 2000.11.07
申请号 JP20000100910 申请日期 2000.04.03
申请人 NIKON CORP 发明人 HIRUKAWA SHIGERU;SHIRAISHI NAOMASA
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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