| 摘要 |
[Problem] To provide a spray etching device whereby maintenance is facilitated, size of the device can be easily reduced, and high-quality spray etching treatment can be performed. [Solution] This spray etching device includes at least an etching chamber 16, a liquid-feeding unit 40, and a drive unit 50, and the liquid-feeding unit 40, the etching chamber 16, and the drive unit 50 are aligned in the width direction orthogonal to the transfer direction of a glass substrate 100. The etching chamber 16 includes at least an upper spray piping unit 162 and a lower spray piping unit 164, which are movable, and are configured to spray an etching liquid to the glass substrate 100. |
