发明名称 ELECTROSTATICALLY ATTRACTING APPARATUS
摘要 <p>PROBLEM TO BE SOLVED: To provide an electrostatically attracting apparatus superior in plasma transparency by facilitating manufacture in simple and easy structure, enhancing manufacturing yield to make a manufacturing cost inexpensive, improving the heat conductance of an electrostatically attracted plate-like specimen and a temperature control part, and facilitating maintaining of the temperature of the plate-like specimen at a desirable constant temperature. SOLUTION: The electrostatically attracting apparatus 1 is provided with an insulation dielectric layer 4 mounting the plate-like specimen, an electrode layer 5 formed on the rear face of the insulation dielectric layer 4, an insulating body layer 6 comprising polyimide-based resin coating the electrode layer 5, and a temperature control part 3 adhered to and joined on the insulating body layer 6. The withstand voltage of the polyimide-based resin is 50 KV/mm or more, permittivity 4 or less, dielectric loss tangent 0.01 or less, the thickness of the insulating body layer 20-50μm, the thickness of the electrode layer 0.01-200μm, the thickness of the dielectric layer 0.5-4 mm, and the insulating body layer and the temperature control part are joined and adhered by an adhesive having rubber elasticity.</p>
申请公布号 JP2001338970(A) 申请公布日期 2001.12.07
申请号 JP20000157308 申请日期 2000.05.26
申请人 SUMITOMO OSAKA CEMENT CO LTD 发明人 KOSAKAI MAMORU;ISHIMURA KAZUNORI;FUJITA AKIYASU
分类号 B23Q3/15;H01L21/68;H01L21/683;(IPC1-7):H01L21/68 主分类号 B23Q3/15
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