发明名称 SHAPE SIMULATION METHOD
摘要 <p>PROBLEM TO BE SOLVED: To improve calculation accuracy without prolonging the time of shadowing calculation during shape simulation. SOLUTION: An analysis area is divided into small cells, and every cell has a material composition ratio and the material surface shape is given at an equivalent surface of 0.5. While calculating the surface shadowing effect per a minute time, the in/out of a substance to/from the material surface is calculated, and the material composition ratio of every cell is updated every minute time. As for the shadowing calculation method, a shadowing effect is disregarded in only a cell adjacent to cells which calculate for in/out, or an ultra-highly accurate shadowing calculation is conducted in only an adjoining cell.</p>
申请公布号 JP2001358043(A) 申请公布日期 2001.12.26
申请号 JP20000177263 申请日期 2000.06.13
申请人 SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC 发明人 FUJINAGA MASATO
分类号 C23C14/34;G06F19/00;H01L21/00;H01L21/203;(IPC1-7):H01L21/00 主分类号 C23C14/34
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