发明名称 CHAMFERING METHOD FOR WAFER
摘要 PROBLEM TO BE SOLVED: To provide a chamfering method for a wafer capable of maintaining a machining form and accuracy for a wafer. SOLUTION: In this chamfering method for the wafer, after the outer peripheral part of the wafer is ground, a notch is ground. In grinding the notch, the groove shape of a grinding wheel for a notch is made larger than the groove shape of a grinding wheel for the outer periphery so that the outer peripheral part of the already ground wafer is kept from being ground more than needed.
申请公布号 JP2002001636(A) 申请公布日期 2002.01.08
申请号 JP20000189017 申请日期 2000.06.23
申请人 MEMC JAPAN LTD 发明人 YAMAZAKI TOMOTSUGU;INABA AKIHIRO
分类号 B24B9/00;(IPC1-7):B24B9/00 主分类号 B24B9/00
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