发明名称 LIQUID COATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To reduce the quantity of a liquid necessary to a material to be uniformly coated by a liquid coating apparatus. SOLUTION: A liquid is atomized by a liquid jet device 312 to eject liquid drops L and these liquid drops L are supplied to a diffusion plate 102 and the liquid thus supplied is averaged on the diffusion plate 102, and this diffusion plate 102 is brought into contact with the surface of a photosensitive material 16 to transfer and apply the averaged liquid to the surface of the photosensitive material 16. By this constitution, only a small amount of the liquid required in coating is ejected from the liquid jet device 312 to be supplied to the diffusion plate 102 and the liquid is thinly and averagely applied to the surface of the photosensitive material 16. By this constitution, the amount of the liquid applied to the photosensitive material 16 is made as little as possible to enable uniform coating.
申请公布号 JP2002086020(A) 申请公布日期 2002.03.26
申请号 JP20000275550 申请日期 2000.09.11
申请人 FUJI PHOTO FILM CO LTD 发明人 TAKATSUKA TSUTOMU;SANADA KAZUO
分类号 B41J2/01;B05B1/14;B05C5/00;B05C11/04;(IPC1-7):B05B1/14 主分类号 B41J2/01
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