| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a ceramic heater for semiconductor manufacturing and an inspection apparatus, with which the temperature of a heated object can be measured accurately and the semiconductor wafer as a whole is heated uniformly by regulating the heating status of a heating element, according to a result of the above temperature measurement. SOLUTION: In the ceramic heater for semiconductor manufacturing and the inspection apparatus, the heating element is formed on the surface of or in the inside a ceramic substrate on which a thermometric component is provided so that it is in contact with the ceramic substrate, wherein the surface roughness of the ceramic substrate is determined as Ra<=5μm.</p> |
