| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an exposure method and aligner, which can expand an exposing area by utilizing a projection optical system which is simplified in structure but assures superiority in economy. SOLUTION: In the exposure method, where a pattern on a mask is projected on a body to be processed with a projection exposure system and thereby the desired pattern is formed on the body to be processed, an exposure pattern region on the mask is divided into a plurality of sections and individual projection optical systems are used for each section of the divided sections, to expose an inverted image on the body to be processed.</p> |
