发明名称 ACTIVE MATRIX SUBSTRATE AND MANUFACTURING METHOD FOR ACTIVE MATRIX SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide an active matrix substrate having no defect by anode- oxidizing a signal conductor and its manufacturing method. SOLUTION: The signal conductor is formed with the source electrode of a metallic thin-film and anode-oxidized so as to be brought into contact with a silicon layer containing insular impurities. An active silicon layer is formed, and crystallized by a laser irradiation. A gate insulating film and a scanning line combining a gate electrode are formed. Since a plurality of insulating films are formed between the signal conductor and the scanning line, the defect due to a short circuit between the signal conductor and the scanning line can be prevented. Since the source electrode can be formed without forming a through-hole, there is no defective contact, and an active matrix type liquid- crystal display body conducting an excellent display can be manufactured.</p>
申请公布号 JP2003158249(A) 申请公布日期 2003.05.30
申请号 JP20020233853 申请日期 2002.08.09
申请人 SEIKO EPSON CORP 发明人 HASHIZUME TSUTOMU
分类号 G02F1/1343;G02F1/1368;H01L21/768;H01L23/52;H01L27/12;H01L29/786;(IPC1-7):H01L27/12;G02F1/136;G02F1/134 主分类号 G02F1/1343
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