| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photoresist composition which is excellent in a pattern form with uniformity, high sensitivity and high resolution in thick film pattern forming, is excellent in substrate adhesiveness, film leaving property and storage stability, can obtain a high throughput, and can bear a metallic growth stress. <P>SOLUTION: Alkali soluble cellulose obtained by substituting gulucose ring substituents of cellulose for an organic group by a specific reaction ratio is used as a binder for the photoresist composition. The photoresist composition contains an alkali soluble cellulose resin of which the average rate per a unit gulucose ring of a specific organic group in Rs in a general formula is 2-30 mol%. <P>COPYRIGHT: (C)2004,JPO |
