发明名称 |
Semiconductor processor with wafer face protection |
摘要 |
A semiconductor processing station which utilizes a processing head and processing base which are complementary to enclose a processing chamber. The processing head shown has a rotor with two portions both of which rotate. The rotor has axial movable portions which include a piece holder. The piece holder supports a wafer or other semiconductor piece being processed. The piece holder can be axially extended and retracted relative to a thin membrane which acts as a cover to prevent chemicals from reaching the back side of the wafer during processing.
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申请公布号 |
US6746565(B1) |
申请公布日期 |
2004.06.08 |
申请号 |
US20000478870 |
申请日期 |
2000.01.07 |
申请人 |
SEMITOOL, INC. |
发明人 |
BLECK MARTIN C.;REARDON TIMOTHY J.;BERGMAN ERIC J.;OBERLITNER THOMAS H |
分类号 |
H01L21/00;H01L21/687;(IPC1-7):C23F1/00;H01L21/306 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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