发明名称 Semiconductor processor with wafer face protection
摘要 A semiconductor processing station which utilizes a processing head and processing base which are complementary to enclose a processing chamber. The processing head shown has a rotor with two portions both of which rotate. The rotor has axial movable portions which include a piece holder. The piece holder supports a wafer or other semiconductor piece being processed. The piece holder can be axially extended and retracted relative to a thin membrane which acts as a cover to prevent chemicals from reaching the back side of the wafer during processing.
申请公布号 US6746565(B1) 申请公布日期 2004.06.08
申请号 US20000478870 申请日期 2000.01.07
申请人 SEMITOOL, INC. 发明人 BLECK MARTIN C.;REARDON TIMOTHY J.;BERGMAN ERIC J.;OBERLITNER THOMAS H
分类号 H01L21/00;H01L21/687;(IPC1-7):C23F1/00;H01L21/306 主分类号 H01L21/00
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