发明名称 |
Photomask and method for creating a protective layer on the same |
摘要 |
A photomask and method for creating a protective layer on the photomask are disclosed. The method includes placing a photomask including a patterned layer formed on at least a portion of a substrate in a chamber. Oxygen is introduced into the chamber proximate the patterned layer and the photomask is exposed to radiant energy that initiates a reaction between the oxygen and the patterned layer in order to passivate the patterned layer and prevent optical properties of the patterned layer from being altered by a cleaning process. |
申请公布号 |
AU2003295844(A8) |
申请公布日期 |
2004.06.18 |
申请号 |
AU20030295844 |
申请日期 |
2003.11.25 |
申请人 |
DUPONT PHOTOMASKS, INC. |
发明人 |
CHRISTIAN CHOVINO;LAURENT DIEU |
分类号 |
G03C5/00;G03F1/00;G03F9/00 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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