| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive compound equipped with both functions of a free radical-generating agent and a radical polymerizable and curing reactive component, having a high heat resistance, stability and preservation property, exhibiting a high sensitivity to a practical wave lenth, without generating a smell on oxposing to light, without leaving the radical generator independently in the cured material after its curing, and also synthesized under a relatively mild condition and showing a high productivity. <P>SOLUTION: This photosensitive compound consists of (a) a compound having a naphthalimide structure-containing group and an ethylenically unsaturated group in one molecule or (b) a polymer obtained by polymerizing ≥1 kind radical-polymerizable compound including the compound (a). The photosensitive resin composition is used as a forming material of a coating, a printing ink, a color filter, an electronic part, an interlayer insulation film, a wiring-coating film, an optical member, an optical circuit, an optical circuit part, a reflection-preventing film, a hologram or a construction material. <P>COPYRIGHT: (C)2004,JPO |
