MASK, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a mask with which halftone exposure is successfully carried out without being affected by the resolution threshold of an exposing device and an exposure method.

SOLUTION: A pattern 2 which is formed on the mask M and has shielding sections 6 for shielding exposure light and transmission sections 7 transmitting the exposure light is exposed onto a photosensitive substrate. At this time, the pattern 2 has repeating regions 5 where the transmission sections 7 with respect to the shielding sections 6 are repeated at a prescribed pitch D. The pattern 2 of the mask M is exposed dividedly several times by shifting the mask M relative to the photosensitive substrate by as much as the pitch D to the direction X where the transmission sections are repeated.

COPYRIGHT: (C)2004,JPO&NCIPI