发明名称 Method of manufacturing nonlinear element, method of manufacturing electrooptic device, electrooptic device, and electronic apparatus
摘要 The present invention provides a method of manufacturing a nonlinear element capable further improving nonlinearity of a nonlinear element, an electrooptic device, and electronic apparatus. In forming an element substrate of a liquid crystal device, an underlying layer is formed on the surface of the element substrate in the underlying layer forming step (a), and then a first metal film having a metal film containing at least Ta is formed in the first metal film forming step (b). Then, in the insulating film forming step (c), the first metal film is annealed under high pressure in an atmosphere containing water vapor to form an insulating film on the first metal film. Then, in the second metal film forming step, a second metal film is formed on the surface of the insulating film to produce a nonlinear element.
申请公布号 US6831728(B2) 申请公布日期 2004.12.14
申请号 US20020115005 申请日期 2002.04.04
申请人 SEIKO EPSON CORPORATION 发明人 WATANABE YOSHIHIRO;SEKI TAKUMI;NAONO HIDEAKI;TAGUCHI SATOSHI
分类号 G02F1/1365;H01L45/00;H01L49/02;(IPC1-7):G02F1/136 主分类号 G02F1/1365
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