发明名称 RESIST COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a new resist composition for manufacture of a printed board. <P>SOLUTION: The new resist composition contains: (A) a resin component; (B) a photopolymerization initiator; (C) water; and (D) an organic solvent. The organic solvent (D) contains: (D-1) at least one kind of organic solvent selected from the group consiting of &alpha;-hydrocarboxylate, &beta;-alkoxycarboxylate, 1,3-diol compounds and 1,3-diol compound derivatives; and (D-2) an organic solvent having a hydroxyl group excluding the above (D-1). The resist composition suppresses a problem of ion crosslink by copper ions eluting from a copper plate in a dip coating method while keeping sensitivity. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005043878(A) 申请公布日期 2005.02.17
申请号 JP20040201631 申请日期 2004.07.08
申请人 SHOWA DENKO KK 发明人 ISHIGAKI SATOSHI;MATSUKI KUNIO
分类号 G03F7/004;G03F7/16;H05K3/06 主分类号 G03F7/004
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