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发明名称
低介电材料的处理方法以及半导体元件
摘要
一种低介电材料的处理方法以及半导体元件。首先,提供一低介电材料。然后,对低介电材料进行一第一处理而改变低介电材料的第一特性。接着,对低介电材料进行一第二处理而改变低介电材料的第二特性。如此就能制造出具有较好机械稳定性的低介电材料。
申请公布号
TW200532845
申请公布日期
2005.10.01
申请号
TW093124365
申请日期
2004.08.13
申请人
台湾积体电路制造股份有限公司
发明人
梁孟松;卢永诚;张惠林
分类号
H01L21/76
主分类号
H01L21/76
代理机构
代理人
洪澄文;颜锦顺
主权项
地址
新竹市新竹科学工业园区力行六路8号
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