| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma treatment device in which substitution of gas can be carried out within a very short period of time. <P>SOLUTION: This plasma treatment device is equipped with a gas supplying means to supply desired gas to a plasma generating space 16 that is under a pressure near the atmospheric pressure, three or more electrodes 5a, 5b, 5c in order to generate the plasma 8 in the plasma generating space 16, a power source 6 for impressing voltages on one or more voltage impressing target electrodes selected from the three or more electrodes in order to generate the plasma 8 in the plasma generating space 16, and a switching circuit 7 as a switching means of voltage impressing state in order to switch selection of the voltage impressing target electrode so that a first generating region and a second generating region will be switched wherein regions in which the plasma 8 is generated in the plasma generating space 16 are different from each other. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
