发明名称 |
Photovoltaic element and method of manufacturing the same, and solar battery module |
摘要 |
A back contact heterojunction photoelectric conversion device, that obtain junctions that are nearly ohmic contacts by integrally forming a transparent conductive film including an electrode directly on a p-type amorphous silicon film and a transparent conductive oxide directly on an n-type amorphous silicon film. A method of manufacturing the device includes: integrally forming an oxide electrode layer on the n-type amorphous silicon film and the p-type amorphous silicon film; and applying plasma, under a condition that a mask is disposed on the transparent conductive film covering either the n-type amorphous silicon film or the p-type amorphous silicon film, to exposed portions of transparent conductive film. |
申请公布号 |
US9472711(B2) |
申请公布日期 |
2016.10.18 |
申请号 |
US201214376290 |
申请日期 |
2012.03.29 |
申请人 |
Mitsubishi Electric Corporation |
发明人 |
Matsuura Tsutomu;Yamarin Hiroya;Tokioka Hidetada |
分类号 |
H01L21/00;H01L31/18;H01L31/068;H01L31/0747;H01L31/20;H01L31/0224;H01L31/028;H01L31/042;H01L31/075;H01L31/04 |
主分类号 |
H01L21/00 |
代理机构 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
代理人 |
Oblon, McClelland, Maier & Neustadt, L.L.P. |
主权项 |
1. A method of manufacturing a photovoltaic element, comprising:
a step of forming an n-type semiconductor layer on a first region of a face of a semiconductor crystal substrate; a step of forming a p-type semiconductor layer on a second region of the face; a step of integrally forming a contact electrode layer, whose chief element is oxide, on the face, and surfaces of the n-type semiconductor layer and the p-type semiconductor layer; a step of adjusting a carrier density of the contact electrode layer above either the first region or the second region so that a carrier density of the contact electrode layer above the first region becomes larger than a carrier density of the contact electrode layer above the second region; and a step of cutting the contact electrode layer to separate the contact electrode layer above the first region and the contact electrode layer above the second region. |
地址 |
Tokyo JP |