| 发明名称 |
ETCHING METHOD FOR MULTILAYER FILM |
| 摘要 |
<p>PURPOSE:To perform etching of optical laminated film or the like quickly and at high precision by forming multilayer discontinuous film laminated with plural layers of different materials through reactive sputtering-etching.</p> |
| 申请公布号 |
JPS53135348(A) |
申请公布日期 |
1978.11.25 |
| 申请号 |
JP19770049089 |
申请日期 |
1977.04.30 |
| 申请人 |
TOKYO SHIBAURA ELECTRIC CO |
发明人 |
YANO KENSAKU;TAKAHASHI KENJI |
| 分类号 |
C23F4/00;G02B5/20;G02B5/28;H04N9/07 |
主分类号 |
C23F4/00 |
| 代理机构 |
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代理人 |
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| 地址 |
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