VACUUM DEPOSITION APPARATUS

摘要

PURPOSE:To make uniform the distribution of the flow velocity of the vapor deposition in the widthwise direction of a plate to be vapor-deposited, and to facilitate the control of the flow rate by providing a guide to the outlet of a bath in a vapor deposition tank, and regulating the widthwise direction. CONSTITUTION:A vapor deposition tank is constituted of a bath 2 and a channel 6, and a guide 10 is provided between the bath 2 and the channel 6. The guide 10 is installed to be changeable in accordance with the width of a plate 7 to be vapor-deposited. And a shutter 5 for controlling the flow rate of the vapor is provided to the upper surface of the bath 2. the distribution of the flow velocity of the vapor deposition in the widthwise direction of the plate 7 to be vapor- deposited can be made uniform and the control of the flow rate can be facilitated by said apparatus.