| 摘要 |
The invention relates to apparatus for producing a microwave plasma for the treatment of substrates, and in particular for the plasma polymerization of monomers for coating substrates. The apparatus consists of a reaction chamber with a carrier for conveying the substrates and a way for maintaining an atmosphere of ionizable gases and monomers. The apparatus also has a first and at least one second wave-guide structure which are arranged at opposite acute setting angles to the surface of the substrate carrier and are each connected at one end to a microwave transmitter by way of a hollow conductor. Thus, the treatment intensities, i.e. the rates of deposition, are superposed, and this leads to greater uniformity in the properties of the product. The apparatus may also include angling the wave-guide structures toward each other and staggering crossbar structures in the wave-guides for further improvement.
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