| 摘要 |
PROBLEM TO BE SOLVED: To provide a control device and method for controlling a manipulator of a microlithographic projection lens, an adjustment apparatus for adjusting a projection lens, and a projection exposure apparatus.SOLUTION: There is provided the control device for controlling at least one manipulator of a microlithographic projection lens by generating a travel command, which defines a change to be undertaken, of an optical effect of at least one optical element of the projection lens by manipulating a property of the optical element via the at least one manipulator along a travel. The control device is configured to generate the travel command for the at least one manipulator from a state characterization of the projection lens by optimizing a merit function. Here, the merit function includes a linear combination of at least two exponential expressions, a setting of the manipulator is represented by a travel variable, the base of the exponential expressions contains a function of the travel variable, and the exponents have different values.SELECTED DRAWING: Figure 1 |
