| 摘要 |
PURPOSE:To reduce adhesion of dust to the surface of a wafer in an environment of vertically flowing clean air by keeping the wafer in the vertical posture while the waiting time in a cassette in the carrying process. CONSTITUTION:A forcing up hand 14a moves in the Y direction by a predetermined value in order to adsorb with vacuum the reverse of a wafer 9 and lift it out of a cassette, and then it forces the wafer 9 upwardly in the Z direction to locate it out of the cassette after adsorbing the same. Next, a carrying and recovering hand 25 adsorbs with vacuum the reverse of the wafer 9 forced out of the cassette to deliver the wafer 9 from the hand 14a to the hand 25, and then the hand 14a lowers to return to the origin. A carriage 22 carries the wafer 9 to just before a pre-alignment stage 3 with the wafer 9 in the adsorbed posture by the carrying and recovering hand 25. At this position, the hand 25 sucking the wafer 9 rotates around an orthogonal axis to the Z axis to get wafer 9 in the horizontal posture, and then delivers the wafer 9 to the pre-alignment stage 3 in accordance with expansion and contraction or the like of an arm 24.
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