PROCESSING APPARATUS AND PROCESSING METHOD, AND GAS CLUSTER GENERATION APPARATUS AND GENERATION METHOD

摘要

PROBLEM TO BE SOLVED: To perform processing using gas clusters without allowing an apparatus configuration to be complicated or large-sized, without letting the amount of gas clusters be insufficient, and without generating residuals.SOLUTION: A processing apparatus comprises: a processing container 1 that has an object S to be processed disposed and is kept in a vacuum state; an evacuation mechanism 6 for evacuating the inside of the processing container 1; a gas supply unit 12 for supplying gas including cluster generation gas for generating gas clusters; a cluster nozzle 11 that is provided in the processing container 1 and makes the cluster generation gas supplied from the gas supply unit 12 be adiabatically expanded inside the nozzle to generate gas clusters before jetting a gas component including the generated gas clusters into the processing container 1; and a plasma generation mechanism 22 for generating plasma at the cluster nozzle 11. The gas clusters are ionized by the plasma generated at the cluster nozzle portion; the ionized gas clusters are jetted from the cluster nozzle 11 and are radiated on the object S to be processed to perform predetermined processing.SELECTED DRAWING: Figure 1