发明名称 Water-developable photosensitive plate and its production.
摘要 <p>A water-developable photosensitive resin plate suitable for the manufacture of a relief printing plate having high resistance to water-based inks, high resilience and excellent form stability, which comprises: (A) a copolymer comprising units of (i) an aliphatic conjugated diene monomer (ii) an alpha , beta -ethylenically unsaturated carboxylic acid and (iii) a polyfunctional vinyl monomer, optionally with (iv) a monofunctional vinyl monomer, the content of the aliphatic conjugated diene monomer (i), the alpha , beta -ethylenically unsaturated carboxylic acid (ii), the polyfunctional vinyl monomer (iii) and the monofunctional vinyl monomer (iv) being respectively from about 5 to 95 mol %, from about 1 to 30 mol %, from about 0.1 to 10 mol% and 0 to 70 mol% based on the combination of those monomeric components; (B) a basic nitrogen atom-containing compound; (C) an ethylenically unsaturated monomer; and (D) a photopolymerization initiator. m</p>
申请公布号 EP0261910(A2) 申请公布日期 1988.03.30
申请号 EP19870308332 申请日期 1987.09.21
申请人 NAPP SYSTEMS (USA) INC. 发明人 ISHIKAWA, KATSUKIYO;KONISHI, KATSUJI;KUSUDA, HIDEFUMI
分类号 C08F2/44;C08F2/48;G03F7/00;G03F7/004;G03F7/027;G03F7/032;G03F7/033 主分类号 C08F2/44
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