| 摘要 |
<p>A dry etching apparatus comprises a reaction chamber (10) having an inlet (12) of an etching gas and an outlet (14) of a product gas, a first electrode structure (16) provided in the reaction chamber with a major surface adapted for supporting an object (18), a second electrode structure (20) having a major surface that opposes the major surface of the first electrode structure with a parallel relationship, the second electrode structure having optical passage (20a, 20b, 26) for passing an optical beam, the optical passage including a transparent window (26) provided on a chamber wall of the reaction chamber, an aperture (20a) provided on the major surface of the second electrode structure in alignment with the window, and a void (20b) formed between the aperture and the window for freely passing the optical balm between the window and the aperture, a cover member (30) mounted detachable on the second electrode structure to cover the major surface thereof wherein the cover member having an aperture (30a) in alignment with the aperture on the major surface of the second electrode means to pass an optical beam that has entered into the optical passage through the window and exiting through the aperture on the major surface of the second electrode means; an optical source (24) for producing coherent optical beam and directing the coherent optical beam to pass successively the optical passage in the second electrode means and further through the aperture in the cover member, and an optical detector (32, 34, 36) for detecting a reflection optical beam produced as a result of reflection of the incident coherent optical beam at the object and exiting after passing through the aperture in the cover member and the optical passage in the second electrode structure through the window on the wall of the reaction chamber.</p> |
