| 摘要 |
<p>In a rapid thermal heating apparatus lamps (19) are disposed in a plurality of light pipes (21) arranged to illuminate and supply heat to a substrate (61). The light pipes (21) are positioned so that the illumination patterns overlap. The energy supplied to the lamps (19) is controlled to provide a predetermined heating pattern to the substrate (61). A liquid cooled window (17) cooperates with the light pipes (21) to transmit energy to a wafer (61) disposed in an evacuated chamber (13).</p> |
