发明名称 |
COIL SUBSTRATE, METHOD OF MANUFACTURING COIL SUBSTRATE AND INDUCTOR |
摘要 |
A coil substrate includes a stacked structure in which a plurality of structures are stacked, each of the structures including a first insulating layer and a wiring formed on the first insulating layer, which becomes a part of a spiral-shaped coil; and an insulating film that covers a surface of the stacked structure, the spiral-shaped coil being formed by connecting the wirings of the adjacent structures in series. |
申请公布号 |
US2016284458(A1) |
申请公布日期 |
2016.09.29 |
申请号 |
US201615180421 |
申请日期 |
2016.06.13 |
申请人 |
SHINKO ELECTRIC INDUSTRIES CO., LTD. |
发明人 |
NAKAMURA Atsushi;NAKANISHI Tsukasa;SASADA Yoichi |
分类号 |
H01F17/00;H01F17/04 |
主分类号 |
H01F17/00 |
代理机构 |
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代理人 |
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主权项 |
1. A coil substrate comprising:
a stacked structure in which a plurality of structures are stacked, each of the structures including a first insulating layer and a wiring formed on the first insulating layer, which becomes a part of a spiral-shaped coil; and an insulating film that covers a surface of the stacked structure, the spiral-shaped coil being formed by connecting the wirings of the adjacent structures in series. |
地址 |
Nagano JP |