发明名称 |
SINGLE CRYSTAL GROWNING METHOD OF COMPOUND SEMICONDUCTOR METERIAL |
摘要 |
The single crystal growth of a semiconductor by the liquid encapsulated Czochralski method comprises (a) dipping a seed crystal (4) into the primary fused solution (9) with gallium, arsenic and high concentrated impurities, (b) forming the shoulder (15) containing impurities by slowly pulling up, and (c) controlling the concentration of impurities for doping an ingot by smelting the GaAs material rod (14) in the residual solution of the primary fused solution.
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申请公布号 |
KR930007186(B1) |
申请公布日期 |
1993.07.31 |
申请号 |
KR19880011229 |
申请日期 |
1988.08.31 |
申请人 |
SAMSUNG CORNING CO., LTD. |
发明人 |
YU, HAK - DO;KIM, HAN - SAENG;PARK, JU - SONG |
分类号 |
C30B15/00;H01L21/36;(IPC1-7):H01L21/36 |
主分类号 |
C30B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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