发明名称 |
Substrate independent superpolishing process and slurry. |
摘要 |
<p>The present invention utilizes a combination of chemical and mechanical finishing processes to polish a disk substrate surface to near atomic smoothness. Broadly speaking, the surface of a disk substrate that has been machined (i.e., rough ground) to a predetermined surface roughness is subjected to attack by a chemical formulation (called an attacking agent). The chemical formulation is used to soften the substrate material. Then, the softened material is "wiped away" via mechanical action. <IMAGE></p> |
申请公布号 |
EP0664540(A2) |
申请公布日期 |
1995.07.26 |
申请号 |
EP19940480175 |
申请日期 |
1994.12.20 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
DEN HARTOG, BRENT RAND;HAGAN, JAMES ALOYSIUS;VISWANATHAN, KANNIMANGALAM V.;FOX, DENNIS LEONARD;SHEN, JOHN CHEN |
分类号 |
B24B37/00;C23F1/16;G11B5/73;G11B5/82;G11B5/84;H01L21/304;(IPC1-7):G11B5/84 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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