发明名称 Support apparatus, lithographic apparatus and device manufacturing method
摘要 A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
申请公布号 US9507275(B2) 申请公布日期 2016.11.29
申请号 US201314403114 申请日期 2013.05.17
申请人 ASML NETHERLANDS B.V. 发明人 Lafarre Raymond Wilhelmus Louis;Koevoets Adrianus Hendrik;Donders Sjoerd Nicolaas Lambertus;Fien Menno;De Groot Antonius Franciscus Johannes;Hoogendam Christiaan Alexander;Jacobs Johannes Henricus Wilhelmus;Ten Kate Nicolaas;Houben Martijn;Westerlaken Jan Steven Christiaan;Overkamp Jim Vincent;Van Beijnum Maarten
分类号 G03B27/58;G03B27/52;G03F7/20 主分类号 G03B27/58
代理机构 Pillsbury Winthrop Shaw Pittman LLP 代理人 Pillsbury Winthrop Shaw Pittman LLP
主权项 1. A support apparatus for a lithographic apparatus, comprising: an object holder configured to support an object; and an extraction body radially outward of the object holder, the extraction body comprising an extraction opening configured to extract fluid from a top surface of the support apparatus, wherein the extraction body is spaced from the object holder such that the extraction body is effectively thermally and/or mechanically decoupled from the object holder, and wherein the extraction body comprises a projection configured such that the projection surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
地址 Veldhoven NL