发明名称 |
HEATER FOR CHEMICAL DEPOSITION |
摘要 |
Heater for chemical vapor deposition device, whereby the heating line that makes with the molybdenum and has a meandering shape, is located on the heating plate, and the heat-proof plate is located in the bottom and side of the heating plate in order to prevent the producting heat of the heat line from emitting.
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申请公布号 |
KR970008839(B1) |
申请公布日期 |
1997.05.29 |
申请号 |
KR19940009004 |
申请日期 |
1994.04.27 |
申请人 |
KIST |
发明人 |
MIN, SUK-KI;KIM, MOO-SUNG;KIM, SUNG-ILL;KIM, YONG |
分类号 |
H05B3/20;C23C16/46;H05B3/16;(IPC1-7):H05B3/20 |
主分类号 |
H05B3/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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