发明名称 HEATER FOR CHEMICAL DEPOSITION
摘要 Heater for chemical vapor deposition device, whereby the heating line that makes with the molybdenum and has a meandering shape, is located on the heating plate, and the heat-proof plate is located in the bottom and side of the heating plate in order to prevent the producting heat of the heat line from emitting.
申请公布号 KR970008839(B1) 申请公布日期 1997.05.29
申请号 KR19940009004 申请日期 1994.04.27
申请人 KIST 发明人 MIN, SUK-KI;KIM, MOO-SUNG;KIM, SUNG-ILL;KIM, YONG
分类号 H05B3/20;C23C16/46;H05B3/16;(IPC1-7):H05B3/20 主分类号 H05B3/20
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