发明名称 Two-level spiral inductor structure having a high inductance to area ratio
摘要 A high-Q monolithic inductor structure formed using conventional silicon technology and having a first complete lower inductor spiral formed on a substrate and a second complete upper formed on a insulating layer over the first inductor spiral. Central portions of the inductor spirals are connected through a via hole in the insulating layer. The inductor spirals are oriented such that the current flows in the first and second spirals are in the same direction.
申请公布号 US5656849(A) 申请公布日期 1997.08.12
申请号 US19960594455 申请日期 1996.01.31
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BURGHARTZ, JOACHIM NORBERT;JENKINS, KEITH AELWYN;PONNAPALLI, SAILA;SOYUER, MEHMET
分类号 H01L23/522;(IPC1-7):H01L29/00 主分类号 H01L23/522
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