| 摘要 |
PROBLEM TO BE SOLVED: To obtain a 100} flat grain emulsion high in chloride content and increased in sensitivity by introducing an organic compound for releasing iodide at a slow speed at the time of growth and forming the circumferential region of each of the 100} flat grains. SOLUTION: In a process I, the (100) flat grain emulsion containing a dispersion medium and radiation sensitive silver halide host grains is prepared, and in a process II, the growth on the circumferential edges of each 100} flat grain is continued and at the same time, dislocation of crystal lattice is introduced. After the process I, an iodide ion source compound having a maximum secondary reaction velocity constant of <1×10<3> mol<-1> sec<-1> is introduced into the dispersion medium, and then, iodide ions are released to introduce them into the flat grains on the circumferential edges by substitution of the chloride ions. Then, the crystal lattices are dislocated in the 10% region from the circumferential edge to the inside of each grain of >10% of the total 100} flat grains.
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