| 摘要 |
PROBLEM TO BE SOLVED: To obtain a coating forming material excellent in light transmittance to far UV and giving a photoresist for far UV by using a polymer having specified repeating units and a specified number average mol. wt. SOLUTION: The coating forming material comprises a polymer having repeating units represented by formula I and a number average mol. wt. of 3,000-30,000. The polymer is preferably obtd. by the ring opening polymn. of a norbornance compd. represented by formula II. In formulae I and II, X<1> is H, -COOR<1> , -CH(COOR<1> )2 or -C(COOR<1> )3 , X<2> is H, -COOR<2> , -CH2 COOR<2> , -CH (COOR<2> )2 or -C(COOR<2> )3 , at least one of X<1> and X<2> is a group other than H and R<1> and R<2> are each H or an acid decomposable group but at least one of R<1> and R<2> is an acid decomposable group. The photoresist compsn. contains the coating forming material and a photo-acid generating agent. |
