BEAM DEFLECTOR AND SCANNER

摘要

A beam deflector (40) comprising a pair of mated microprism arrays (42 and 48) with one of the arrays comprised of a variable refractive index material (48) capable of being selectively changed in response to a field whose magnitude or intensity is regulated by regulating voltage applied. The other array (42) preferably is comprised of a material having a constant refractive index. A conductive layer (102 and 104 and 82) is disposed on both sides of the variable refractive index array. A pane (68 and 70) preferably is disposed in front and behind the arrays. Two pairs of the arrays can be arranged parallel to each other with their microprisms generally perpendicular forming a two-dimensional deflector. To achieve a deflection response time faster than 100 microseconds, each prism has a height no larger than about 20 micrometers and a width preferably no greater than about 100 micrometers. Preferably, each prism height is less than about 15 to about 10 micrometers to achieve a response time 30 microseconds or faster. A method of making the deflector includes using direct-write electron beam lithography to make a master for replicating arrays having a height of 10 micrometers or less. A pair of deflectors can be used to deflect a beam in two dimensions and can be used in a scanner. Where the beam is a laser, the deflector can be used in a laser imaging radar assembly. Such a scanner and laser imaging radar assembly provide fast scanning of an object or region advantageously without requiring the deflector to move during scanning.