发明名称 Polarizer and microlithography projection system with a polarizer
摘要 A polarizer suitable for transforming incident linearly polarized or circularly polarized light into exiting radially or tangentially polarized light with virtually no transmission losses has, in one of its embodiments, a plate fabricated from birefringent material on whose entrance and exit faces small zones (11, 12) with deflecting structures (8, 9) in the form of gratings or Fresnel surfaces have been created. The crystal axis (5) of said birefringent material is aligned parallel to the incident light beam. Said deflecting structures deflect light along a transmission direction (13) that is inclined with respect to said crystal axis (5), causing a phase shift between the field components of the transmitted light. Suitable choices of the angle of inclination (NW) of said transmission direction with respect to said crystal axis and the thickness (D) of said plate will allow transforming incident linearly polarized or circularly polarized light into an exiting light beam with an axisymmetric (tangential or radial) polarization distribution.
申请公布号 US2002176166(A1) 申请公布日期 2002.11.28
申请号 US20020151867 申请日期 2002.05.22
申请人 CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG 发明人 SCHUSTER KARL-HEINZ
分类号 G02B5/30;G02B27/18;G02B27/28;G03F7/20;H01L21/027;(IPC1-7):G03B27/72 主分类号 G02B5/30
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