发明名称 ALIGNMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a fixed alignment apparatus that, for example, when it is applied to a proximity exposure device, aligns an original plate with a substrate, without obstructing the optical path of exposure. SOLUTION: This device comprises irradiation systems (4-6) for, along a substantially inclined optical path, irradiating a first diffraction grating mark (7) formed on a first substrate (1) and a second diffraction grating mark formed on a second substrate (3) with a coherent light, imaging systems (6, 9-11) for forming the images, based on the diffraction lights from the first and second diffraction grating marks, respectively, and a detection system (12) for detecting the images of the first and second diffraction grating marks formed via the imaging systems. The first substrate is aligned with the second substrate based on the output of the detection system.
申请公布号 JP2003068613(A) 申请公布日期 2003.03.07
申请号 JP20010255429 申请日期 2001.08.27
申请人 NIKON CORP 发明人 KODAMA KENICHI
分类号 G01B11/00;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01B11/00
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