| 摘要 |
An etching apparatus is disclosed, in which a bubble plate includes a plurality of air tubes having a plurality of holes being arranged in a straight line, and a straight frame having an air path and being connected to both ends of the air tube. The etching apparatus of the present invention reduces the probability of prolonged exposure to harmful chemicals by workers. Additionally, the guide does not have to be separated from the etching apparatus to separate the bubble plate. The etching apparatus reduces the probability of etching inferiority and/or substrate damage caused by incorrect assembly.
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