| 摘要 |
PROBLEM TO BE SOLVED: To suppress degradation of an air cleaning means for purifying air when performing environmental control of an interface which is a space for transferring an object to a processor installed in a clean room. SOLUTION: A chamber 30 whose circumference is closed by the interface 18 for transferring a wafer which is the object to be processed from a wafer pod 14 to a manufacture device 12 installed in the clean room 10 is formed. An environmental control unit 32 provided with a temperature control module, a moisture content removal module, a chemical removal filter, and a particle removal filter is installed in the chamber 30 to circulate air in the chamber 30 through the environmental control unit 32. COPYRIGHT: (C)2003,JPO
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