| 摘要 |
PROBLEM TO BE SOLVED: To provide a means, capable of retaining a small substrate and keeping it flat in a lithographic apparatus having a substrate table for receiving a large substrate or similar substrate treatment apparatus. SOLUTION: A substrate holder suits a small wafer to the wafer table of the lithographic apparatus for receiving a large wafer and comprises a large silicon wafer having a bar pattern for arranging the small wafer, a positioning pin for accurately arranging the small wafer, and a clamp formed by a magnet mounted to a clamp ring and the larger wafer. COPYRIGHT: (C)2004,JPO |
