发明名称 STRUCTURED INTEGRATED CIRCUIT DEVICE WITH MULTIPLE CONFIGURABLE VIA LAYERS
摘要 An integrated circuit may include a multi-layer structure having alternating metal interconnection layers and via layers superimposed on a base layer having electronic components, functional blocks, or both. At least two of the via layers may be customizable and may be used to form customized interconnections that may customize functionality of the resulting integrated circuit. In a variant, at least some of the layers may have a default structure that may result in a default integrated circuit functionality; the default structure may be changed to customize functionality. One or more metal interconnection layers may also be customizable. Additionally, transistors of the base layer may be customized for speed and/or power consumption by adjusting voltage thresholds and/or gate lengths.
申请公布号 US2016293541(A1) 申请公布日期 2016.10.06
申请号 US201514676497 申请日期 2015.04.01
申请人 eASIC Corporation 发明人 ANDREEV Alexander;SCEPANOVIC Ranko
分类号 H01L23/522;H01L21/768;H01L21/8234;H01L27/118 主分类号 H01L23/522
代理机构 代理人
主权项 1. An integrated circuit, including: transistor layers comprising electronic components or functional blocks or both; a plurality of alternating metal interconnection layers and via layers, superimposed on the transistor layers, and configured to form interconnections among the electronic components or functional blocks or both, wherein the plurality of alternating metal interconnection layers and via layers includes at least two customizable via layers; and a contact layer disposed between the plurality of alternating metal interconnection layers and via layers and the transistor layers and configured to provide connectivity between the transistor layers and at least one of the plurality of metal interconnection layers.
地址 Santa Clara CA US
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